Can we do any Plasma cleaning on the HMC-ALH509? Can we place it under vacuum?
On unrelated note, why is there an air-bridge on the device?
Which manufacture of Alumina did you use for characterization?
The HMC-ALH509 can be plasma cleaned. The air bridges are part of the GaAs HEMT fabrication process. When you ask about vacuum, are you referring to picking the die with a vacuum tip? The air-bridges are fairly robust but can be damaged if not vacuum picked properly. With proper technique and care the die can be vacuum picked.
Can someone please help answer these questions?
For vacuum, I meant can we plasma clean the die under vacuum?
But the information you provided was useful too. Thanks!
It's typical to plasma clean the die under vacuum. That is OK.
Could someone reply to my last question, please?
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